Description: A substrate holder is a mechanical fixture used to securely hold a substrate (e.g., silicon wafer, glass, or other thin films) during semiconductor processing, thin-film deposition, etching, or inspection.
Typical Applications:
- Physical Vapor Deposition (PVD)
- Chemical Vapor Deposition (CVD)
- Sputtering Systems
- Etching (Dry/Wet)
- Ion Implantation
- Wafer Inspection & Metrology
Key Features:
- Material: Stainless steel, aluminum, ceramic-coated, or graphite depending on process environment
- Temperature Control: May include heating/cooling channels for thermal management
- Clamping Mechanism: Mechanical clamps, electrostatic chucks (ESC), or vacuum suction
- Electrical Biasing: For plasma processes, may support RF or DC bias
- Compatibility: Designed for standard wafer sizes (e.g., 150mm, 200mm, 300mm)
Note: Proper alignment and flatness are critical to ensure uniform processing and prevent arcing or shadowing.