Description: A substrate holder is a mechanical fixture used to securely hold a substrate (e.g., silicon wafer, glass, or other thin films) during semiconductor processing, thin-film deposition, etching, or inspection.

Typical Applications:

• Physical Vapor Deposition (PVD)
• Chemical Vapor Deposition (CVD)
• Sputtering Systems
• Etching (Dry/Wet)
• Ion Implantation
• Wafer Inspection & Metrology

Key Features:

• Material: Stainless steel, aluminum, ceramic-coated, or graphite depending on process environment
• Temperature Control: May include heating/cooling channels for thermal management
• Clamping Mechanism: Mechanical clamps, electrostatic chucks (ESC), or vacuum suction
• Electrical Biasing: For plasma processes, may support RF or DC bias
• Compatibility: Designed for standard wafer sizes (e.g., 150mm, 200mm, 300mm)

Note: Proper alignment and flatness are critical to ensure uniform processing and prevent arcing or shadowing.